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It is important to note that spectroscopic ellipsometry is an indirect technique which does not measure thin film thickness and/or optical properties directly. In order to determine thin film thickness and/or optical properties, a model-based approach must be used. Ex-situ spectroscopic ellipsometry allows for the characterization of a range of thin film properties including layer thickness, surface roughness thickness, interface thickness, optical constants, composition, band gap, composition, crystallinity, grading, anisotropy, and uniformity by depth and area. It can also be used to calculate the depolarization factor and the Mueller Matrix coefficients.
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